Synchrotron radiation photoelectron emission study of SiO film formed by a hyperthermal O-atom beam at room temperature

Tagawa, Masahito*; Sogo, Chie*; Yokota, Kumiko*; Hachiue, Shunsuke; Yoshigoe, Akitaka; Teraoka, Yuden

Japanese Journal of Applied Physics, 44(12), p.8300 - 8304, 2005/12

https://doi.org/10.1143/JJAP.44.8300

Si oxide layers formed on Si(001) substrates by irradiation of hyperthermal oxygen atomic beams at room temperature were analysed at the JAERI soft X-ray beamline by photoemission spectroscopy. It was found that sub-oxide components were scarcely observed in the Si oxide layers formed by the atomic oxygen beam.